X-RAY DIFFRACTION (XRD) FOR THIN FILM

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INSTRUMENT NAME & MODEL: Thin Film X-Ray Diffraction (XRD) (D8 Discover, Bruker)

Thin film X-ray diffraction (XRD) techniques were used to analyze structural properties such as crystallinity, lattice parameters, strain, and thickness. Measurements were conducted using a Bruker diffractometer equipped with precision optics and controlled through DIFFRAC.SUITE software.

Grazing-Incidence Diffraction (GID / GIXRD) was employed to probe near-surface and in-plane structures using shallow incident angles close to the critical angle, minimizing substrate effects. Phase identification and lattice analysis were performed with DIFFRAC.EVA.

X-ray Reflectivity (XRR) provided film thickness, density, and interface roughness. Reflectivity profiles were modeled in Bruker DIFFRAC.LEPTOS using the Parratt formalism with least-squares refinement, achieving sub-nanometer accuracy.

High-Resolution XRD (HRXRD) and Reciprocal Space Mapping (RSM) characterized epitaxial layers, determining strain, relaxation, and crystalline quality. Data were processed in DIFFRAC.LEPTOS for quantitative lattice and strain analysis.

Small-Angle X-ray Scattering (SAXS) measurements were performed on a Bruker D8 DISCOVER diffractometer configured for small-angle analysis. SAXS revealed nanoscale morphology, particle size, and spatial distribution, with data modeled using DIFFRAC.SAXS analysis.

Together, these complementary X-ray techniques enabled comprehensive, non-destructive characterization of thin film structure and interface quality.

CATEGORY: Material/Nanomaterial Characterization

Special Features

- - SPECIAL FEATURES
    - Multi X-ray techniques including GID, XRR, HRXRD, and SAXS
      • TRIO and TWIN optics
    Fully automatic, motorized switching between up to 6 different beam geometries without any manual user intervention
    - Centric Eulerian Cradle – 2 rotation axis (Phi, Psi), 3 translation axis (X,Y,Z)
      • Alignment Guarantee
    performance verification with NIST corundum standard SRM 1976
    
    Minimum spot size analysis of 15 um.

Applications

Phase Identification & Quantification
Grazing Incidence Diffraction
X-ray Reflectometry
Small Angle X-ray Scattering
High-Resolution X-ray Diffraction

SAMPLE REQUIREMENTS

Thin Films on Flat Substrate
Film thickness range: 5 nanometers to 2 µm.
Film materials: metals, oxides, nitrides, semiconductors, polymers, perovskites, etc.
For HRXRD, Substrate orientation must be well known

Typical Results

RESULT

Data, pictures/images with some explanation
Tables/graphs etc.