Instrument Name & Model: XHR Extreme High Resolution Field Emission Scanning Electron Microscope (XHR-FESEM) Model FEI Verios 460L  

Special Features:

Electron beam resolution:
Resolution @ optimum WD
• 0.6 nm at 30 kV (STEM *)
• 0.7 nm at 15 kV
• 0.7 nm at 1 kV
• nm at 500 V (ICD **)
• 1.2 nm at 200 V (ICD **)

Landing energy range
• 20 eV - 30 keV

Probe current
• E-beam: 0.8 pA up to 100 nA

Detectors
• In-lens SE detector (TLD-SE)
• In-lens BSE detector (TLD-BSE)
• In-column SE detector (ICD) **
• In-column BSE detector (MD) **
• Everhart-Thornley SE detector (ETD)
• IR camera for viewing sample/column
• Chamber mounted Navigation Camera
• Retractable low voltage, high contrast solid-state backscatter electron detector (DBS)
• Oxford Silicon Drift Detector (SDD) - X-Max EDS/EDX detector

Sample sizes
• Maximum size: 0.5cm
• Maximum size: 1cm (Mold sample)
• Maximum sample thickness (via loadlock/chamber door): 19 mm incl. stub
• Weight: 200 g (incl. holder)

Sample holders
• Multi-stub holder (5 stubs)
• Multi-sample cross-sectional holder
• Single stub mount, mounts directly onto stage
• Various wafer and custom holder(s) available by request

Applications:

This instrumentation is particularly suitable for the study and characterization of: 
• Biological materials (Dry Sample Only)
• Polymeric materials
• Metallic materials
• Composite materials
To get information on the morphological, chemical and analytical study of materials.

*Samples required : Dry & Non Magnetic

Location: Microscope Room (G045)

Contact: 

ELECTRON MICROSCOPY LAB